极紫外EUV光刻与3D器件X射线计量方法与关键技术
【文章列表】：https://orcid.org/0000-0003-3442-3987 ；https://webofscience.clarivate.cn/wos/author/record/E-3683-2012 ；
2026[13*], 2025 [12*], 2024【15*], 2023【7*], 2022【6*], 部分文章如下：
1. X 射线光刻：先进芯片图形化定义的终极制造方法
4. Xinkun Wang et al, Positive and Negative Dual-Type Hafnium-Based Hybrid Dry Photoresist for Nanolithography, Applied Materials & Interfaces, Accepted, 2026.
3. Qiao, Yang; Li, Changliang; Yan, Fengbo; Liu, Zhaochao; Wang, Xingkun; Xie, Jianan; Shi, Guangyue; Wei, Jian; Zhao, Jun; Zhang, Lei*; Luo,Feng*, Synergistic Enhancement Effects of Heterogeneous Isomorphism Clusters in Response to Irradiation: Sub-10 nm Nanolithography and Nanoscale Etching Transfer, Nano Letters, Accepted, 2025.
2. Xingkun Wang, Taoli Guo, Yiyang Shan, Ou Zhang, Hong Dong, *, Jincheng Liu, *, Feng Luo*, An aluminum-based hybrid film photoresist for advanced lithography by molecular layer deposition，Journal of Materials Chemistry C, Accepted, 2024.
1. Yang Qiao, Guangyue Shi, Ou Zhang, You Li, Michaela Vockenhuber, Yasin Ekinci, Feng Luo* and Lei Zhang*, Heterometallic Ti-Zr Oxo Nanocluster Photoresists for Advanced Lithography, Science China Materials, Accepted, 2024.
2. 3D-IC异质异构集成：多功能器件与系统构架的终极融合平台
10. Ai, W.#; Luo, X.#; Luo, F*; Wang, J.*; Zhao, J.*; Wu, J*, et al. Transport signatures of gate-tunable topological phase transition in ultrathin beta-Ag2Te. National Science Review, accepted, 2026.
9. Chen, J.#; Dong, X.#; Li, W.*, Luo, F.*, Wu, J*, et al. A layered wide-bandgap BiOF gate dielectric with a high dielectric constant. ACS Nano, accepted, 2026.
8. Yifei, Ma, et al. Ultrafast and reliable domain-wall and skyrmion logic in a chirally coupled ferrimagnet，Newton, 2025, https://doi.org/10.1016/j.newton.2025.100208.
7. Xiang Gao, Shuo Dong, Xiaolong Wang, Tong-Huai Cheng,* Shixin Sun, Muhan Tang, Kaidong Xu,* Feng Luo*, Scalable Wafer-Level Fabrication of Slanted TiO2 Gratings for Directional Visible Light Control, Nano Letters, Accepted, 2025.
6. Cheng TH, Bi Lei*, Luo F*, et al, Magnetoplasmonic Gratings Induced an Unusual Magneto-Optical Kerr Effect at Optical Frequencies，Laser & Photonics Reviews, DOI: 10.1002/lpor.202401476, Accepted, 2025.
5. Yifei Ma, Xiaoxiao Fang, Fengbo Yan, Leran Wang, Rui Yao, Miao Meng, Peixin Qin, Jinbo Yang, Zhiqi Liu,* Zhaochu Luo,* Shuai Ning,* and Feng Luo*，Magnetic Domain Wall Energy Landscape Engineering in a Ferrimagnet, Nano Letters, Accepted, 2024.
4. Yao, Rui; Liu, Zhaochao; Ma, Yifei; Xu, Lingyun; He, Yuyu; Ai, Wei; Li, You; Lu, Feng; Dong, Hong; Gao, Zhansheng*, Wang Wehua*; Luo Feng*, Controlled Synthesis of 2D Ferromagnetic/Antiferromagnetic Cr7Te8/MnTe Vertical Heterostructures for High-Tunable Coercivity, ACS Nano, 2024, DOI: 10.1021/acsnano.4c07128.
3. Zhansheng Gao*, Baojuan Xin, Wei-Hua Wang*, Feng Luo*, et al. Above-room-temperature ferromagnetism in copper-doped two-dimensional chromium-based nanosheets. ACS Nano, 2024, 18, 1, 703–712.
2. Zhang, L#, He, Y.#, Zhou, Z*, Luo, F*, Wu, J*, et al. Controlled synthesis of a high-mobility Bi3O2.5Se2 semiconductor by oxidation of Bi2Se3 for fast and highly sensitive photodetectors. Laser Photonics & Reviews, 2024, 18: 2300854 .
1. Ai, W#, Fu, H. X*, Luo, F*, Deng, M. X.*, Wu, J*, et al. Observation of giant room-temperature anisotropic magnetoresistance in topological insulator. Nature Communications, 2024, 15, 1259.
3. X 射线计量：先进芯片内部结构的终极透视工具
6. Ou Zhang, Fang Jiao*, Gang-Qin Liu, Sichen Mi, Feng Luo*，Self-aligned patterning process for high aspect-ratio nanostructuring in single-crystal diamond, Diamond and Related Materials, https://doi.org/10.1016/j.diamond.2026.113339. 2026.
5. Fengbo Yan et al, Shuai Ning*, Feng Luo*, Defect-engineered ferroelectricity and magnetoelectric coupling in LaFeO3 thin films, Materials Horizons, Accepted, 2026.
4. Liu,Zhao*, Wei,Yunyun; Ouyang,Wengen; Zhang,Jun-Yan; Luo,Feng*, Reversible Electromechanical Manipulation of Domain Wall in Trilayer Graphene via Ferroelectric Sliding, Materials Horizons, Accepted, 2025.
3. Zhao Liu*, Feng Luo* et al, Energy dispersion induced precisely tunable friction of graphitic interface，Advanced Science, DOI: 10.1002/advs.202500378, 2025.
2. “An Ultra-Low Noise and Wide Output Range LDO with BJT Input Stage and Base Current Cancellation Technique” Yun Li et al, Feng Luo *& Zhiming Xiao*, IEEE Transactions on Circuits and Systems I: Regular Papers, Accepted, 10.1109/TCSI.2024.3520301, 2025.
1. Qiuzhen Xu, Gen Li, Yanyan Liu, Feng Luo *and Zhiming Xiao*A 64-Channel Inverter-Based Neural Signal Recording Amplifier with A Novel Differential-like OTA achieving an NEF of 0.84, IEEE Journal of Solid-State Circuits 2024, DOI: 10.1109/JSSC.2024.3363130.
专利列表
已授权发明/实用新型专利：
01）2020113484323：一种可用于选区原子层沉积的微纳加工方法
02）2021102715297：一种适用于粉末样品的原子层沉积装置、沉积方法
03）2022114741174：集成电路制程中晶圆处理的超临界干燥清洗设备及方法
04）2024100044817：一种HZO铁电材料的制备方法
05）2023214657526：一种基于石墨烯电极的电光调制器（实用新型）
06）2023115445651：一种使用分子层沉积制备晶圆级铝基-丁烯二醇干式光刻胶的方法
07）2025101889463：一种多层 EUV 光刻胶的制备方法
08）2023110364446：一种带隙基准电流源、低压差线性稳压器及电源管理器
已受理发明专利：
01）2023101715941：一种直传模式数字隔离器及接收机
02）2023101806404：一种降压稳压电路、稳压器、电源管理器及嵌入式系统
04）2023112053437：一种基于CVD 的新型低功耗MnTe/Cr1-xTe异质结的制备方法
05）2022104963934：一种基于CVD和ALD配合使用制备磁性隧道结器件的方法和应用
06）2023114822852：一种基于溶液辅助旋涂法的超薄原子级平整Ga2O3薄膜的制备方法
07）2023114824152：一种原位制备Cr1-xTe晶态-非晶异质结的方法
08）2025102607549：一种基于分子层沉积技术制备晶圆级纳米压印光刻胶的方法
09) 2025112240466: 一种富Cr 的多相六元非贵金属高熵合金及其制备方法
10）2024109410556：一种使用分子层沉积制备晶圆级干式光刻胶的方法
12）202410339198X ：一种用于基因测序双层孔结构纳米压印模板制造及压印方法
13）2022114464256：一种原子层、分子层沉积设备及沉积方法
14）2022116562145 ：一种晶圆表面量测设备、检测方法及应用
15）2024109265213：一种高亮度X射线源阳极靶
16）2024103600862：一种背反式单色化X射线源装置及其使用方法
17）2024102527802：一种面扫型瞬态光电检测系统
18）2024102527817：一种循环测试控制装置
19）202210791870X：定向中子探测器、探测方法
20）2022112534377：平面内中子放射源精确定位方法、定位装置
21）2022112537464：基于空地协同的中子源探测定位方法、定位装置
22）2022112534235：面排列式阵列中子探测定位装置、定位方法
23）2022112534112：中子放射源快速定位装置、定位方法
24）2022112534127：线排列式阵列中子探测定位装置、定位方法
25）2023112416483：线形高通量电子/离子能谱表面分析,量测仪器和方法
26）2025101426527：一种用于缓解泊松效应的芯片封装结构及其加工方法
27）2023115702523：一种在亚铁磁合金中获得手性耦合的方法
28）2025104437792：一种钕铁硼永磁材料电镀工艺
29）2025104437773：一种降低钕铁硼永磁材料氢含量的方法
30）2025103815394：一种易于晶界扩散的烧结钕铁硼磁体及其制备方法
31）2025103908350：一种高矫顽力高稳定性的含铈钕铁硼磁体及其制备方法
32）2025109852861：一种双激光驱动的超快X 射线瞬态吸收谱仪
会议邀请报告
1. 282期双清论坛 "光学微加工前沿"，2021.05.07-05.08,"面向自旋器件与芯片的微纳加工与制造", 邀请报告。
2. 285期双清论坛 "走向自旋的未来信息时代", 2021.05.10-05.11, "面向自旋器件与芯片的微纳加工与制造", 邀请报告。
3. 2022华为半导体技术论坛, 上海, 2022.12.02-12.03,"面向3nm以下工艺节点的集成电路工艺与装备", 邀请报告。
4. 黄大年茶思屋之极简光学部件技术论坛, 华为武汉研究所, 2023.08.11,"纳米压印技术在半导体领域中的应用", 邀请报告。
5. 中国感光学会第三届光刻材料与技术讨论会, 北京, 2025.11.21-11.23, "目面向下一代高数值孔径EUV光刻的物理沉积光刻胶材料", 主旨邀请报告。
6. 8th International Workshop on Advanced Patterning Solutions (IWAPS2024), Jiaxin, Xhejiang, 202410.15-10.16, “EUV Photoresist forAdvanced 0.55NA Lithography”, Invited talk.
7. 9th International Workshop on Advanced Patterning Solutions (IWAPS2025), Shenzhen, 202510.14-10.15, “EUV Dry Photoresist for Advanced 0.55 NA Lithography”, Invited talk.
8. “The effect of stress on HfO2-based ferroelectric thin films”, invited speech for Symposium IV (Thin Film, Piolating and Process Integration) of China Semiconductor Technology Internatnal Conference (CSTIC-2024), March 17-18, 2024, in conjunction with SEMICON China.
9. The 2nd Global Nanoimprint Technology and Application Conference (NTAC 2024), 202410.23-10.24, Suzhou, Jiangsu, “Nanoimprint Lithography and Process for MEMS Application”, Invited talk.
10. The 3nd Global Nanoimprint Technology and Application Conference (NTAC 2025), 202510.22-10.23, Suzhou, Jiangsu, “Nanoimprint Lithography and Process for MEMS/NEMS Application”, Invited talk.
